Premium MPCVD Diamond on Silicon Substrates – Ideal for High-Performance Applications

Premium MPCVD Diamond on Silicon Substrates – Ideal for High-Performance Applications

DIASEMI, a leading U.S.-based supplier and fabricator of MPCVD diamond materials, offers high-quality CVD diamond on silicon substrates, combining diamond’s superior properties with silicon’s versatility.

Key Specifications:
Diamond Layer:

Growth Method: MPCVD (Microwave Plasma Chemical Vapor Deposition)

Thickness: 15 ± 5 µm | Grain Size: ≤ 20 µm | Surface Roughness (Ra): 0.7 µm

Thermal Conductivity: 1800–2000 W/m·K | Vickers Hardness: 80 GPa

Silicon Substrate:

Diameter: 50.8 ± 0.2 mm | Surface Finish: Single-side polished

Optical Properties:

Band Gap: 5.7 eV | Transmittance: > 60% (for λ > 500 nm)

Emission Lines: NV⁰ (~575 nm) & NV⁻ (~638 nm)

Applications:
✅ Electronics: Heat spreaders, thermal management
✅ Optics: High-transmittance windows, lenses
✅ Sensors: Robust MEMS & pressure sensors

Why Choose DIASEMI?
✔ Customizable – Adjust thickness, grain size, and more
✔ High-Performance – Superior thermal & mechanical properties
✔ Reliable Adhesion – Uniform MPCVD diamond deposition

Contact us today for your CVD diamond needs!
🌐 www.diasemi.us | ✉ sales@semixicon.com

#MPCVD #CVDdiamond #DiamondOnSilicon #ThermalManagement #OpticalMaterials #heatsink #heatspeader #diamondsubstrate #siliconsubstrate

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